The CIML will hold its 44th Meeting in Mombasa (Kenya) from Tuesday 27
(afternoon) to Friday 30 October 2009 (morning). It will be preceded by
an OIML Seminar entitled Stakes and priorities of legal metrology for
trade on Monday 26 October.
During the CIML Meeting, a Round Table on metrological
control will be organized on Wednesday 28 October in the morning. This
will be an ideal occasion to compare approaches and trends in legal metrology
in different countries and Regions, and to discuss a number of fundamental
questions pertaining to legal metrology.
Again this year, I invite you to be ready to take the
floor during the CIML Meeting and to make the most of the Round Table
to present your views on the various issues to be discussed. Unfortunately
it will not be possible to provide translation into French, so all the
meeting sessions will be held in English only.
As you know, it is essential that the Committee have sufficient
voting Members for a quorum. Therefore:
- if you are unable to personally attend this meeting,
please ensure you delegate your vote to a member of your staff or to
a representative of your Embassy in Kenya;
- if you anticipate that you or your delegation may
be absent during any of the CIML Meeting sessions, please give a proxy
to another CIML Member when registering online.
The BIML has prepared this web site for the Mombasa meetings;
it gives detailed information about the Seminar and the CIML Meeting.
Registration for attendance at the Seminar and at the CIML Meeting will
again this year be online via this web site. The deadline for registering
is 15 July 2009; if you are unable to register via the web site,
please contact the BIML and alternative arrangements will be made.
Lastly, obtaining a visa may be a lengthy process so I
urge you to make your application as soon as possible.
Looking forward to seeing you again in Mombasa,
Alan E. Johnston